On the optimal design of grid-based binary holograms for matter wave lithography

Grid based binary holography (GBH) is an attractive method for patterning with light or matter waves. It is an approximate technique in which different holographic masks can be used to produce similar patterns. Here we present an optimal design method for GBH masks that allows for freely selecting the fraction of open holes in the mask from below 10% to above 90%. Open-fraction is an important design parameter when making masks for use in lithography systems. The method also includes a rescaling feature that potentially enables a better contrast of the generated patterns. Through simulations we investigate the contrast and robustness of the patterns formed by masks generated by the proposed optimal design method. It is demonstrated that high contrast patterns are achievable for a wide range of open-fractions. We conclude that reaching a desired open-fraction is a trade-off with the contrast of the pattern generated by the mask.